Holography News in Brief

Combining dot matrix and e-beam origination

To enhance the level of holographic protection against forgery, Lithuanian researchers from the KTU Institute of Materials Science have come up with the idea of combining dot matrix and electron beam (e-beam) origination processes to create a security device that uses the best of both techniques.

Whereas the dot matrix technique has a high origination speed and can expose large areas of a hologram with high diffraction efficiency, it does not guarantee a very high level of protection. E-beam lithography, on the other hand, allows the formation of high-resolution structures, which expose smaller areas of the hologram and which are practically inaccessible to potential hologram counterfeiters, according to Dr Viktoras Grigaliūnas, a KTU researcher who contributed to the development of the technology.

The US Patent and Trademark Office and the Japanese Patent Office have recognised the combination of these two techniques.

Holographic security labels developed by KTU scientists.